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    Li Huidong, Duan Shuzhen, Zhang Xin. Chromium Electroplating Using Reduced Product of Hexavalent Chromium[J]. Chinese Journal of Engineering, 1993, 15(6): 614-618. doi: 10.13374/j.issn1001-053x.1993.06.014
    Citation: Li Huidong, Duan Shuzhen, Zhang Xin. Chromium Electroplating Using Reduced Product of Hexavalent Chromium[J]. Chinese Journal of Engineering, 1993, 15(6): 614-618. doi: 10.13374/j.issn1001-053x.1993.06.014

    Chromium Electroplating Using Reduced Product of Hexavalent Chromium

    doi: 10.13374/j.issn1001-053x.1993.06.014
    • Received Date: 1993-06-21
      Available Online: 2021-10-18
    • Effects of different reducers as well as various reaction conditions on reducing of hexavalent chromium were investigated. The reaction process was discussed and the optimum reaction conditions were determined. The reaction product can serve as chromium source of nontoxic chromium plating and coating thicker than 100μm was obtained.

       

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