N<sub>2</sub>/H<sub>2</sub>比對化學氣相沉積氮化鈦涂層的影響

留言板

尊敬的讀者、作者、審稿人, 關于本刊的投稿、審稿、編輯和出版的任何問題, 您可以本頁添加留言。我們將盡快給您答復。謝謝您的支持!

姓名
郵箱
手機號碼
標題
留言內容
驗證碼

N₂/H₂比對化學氣相沉積氮化鈦涂層的影響

張林榮, 張福林

文章導航 > 工程科學學報 > 1988 > 10(3): 360-363

張林榮, 張福林. N2/H2比對化學氣相沉積氮化鈦涂層的影響[J]. 工程科學學報, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

引用本文:

張林榮, 張福林. N₂/H₂比對化學氣相沉積氮化鈦涂層的影響[J]. 工程科學學報, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

Zhang Linrong, Zhang Fulin. Influence of Different N2/H2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

Citation:

Zhang Linrong, Zhang Fulin. Influence of Different N₂/H₂ Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

張林榮, 張福林. N2/H2比對化學氣相沉積氮化鈦涂層的影響[J]. 工程科學學報, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

引用本文:

張林榮, 張福林. N₂/H₂比對化學氣相沉積氮化鈦涂層的影響[J]. 工程科學學報, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

Zhang Linrong, Zhang Fulin. Influence of Different N2/H2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

Citation:

Zhang Linrong, Zhang Fulin. Influence of Different N₂/H₂ Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Chinese Journal of Engineering, 1988, 10(3): 360-363. doi: 10.13374/j.issn1001-053x.1988.03.014

N₂/H₂比對化學氣相沉積氮化鈦涂層的影響

doi: 10.13374/j.issn1001-053x.1988.03.014

稀有教研室

計量
- 文章訪問數: 236
- HTML全文瀏覽量: 75
- PDF下載量: 9
- 被引次數: 0
出版歷程
- 收稿日期: 1987-10-17
- 網絡出版日期: 2021-11-15

Influence of Different N₂/H₂ Ratios by Chemical Vapor Deposition on the Performance of TiN Films

摘要: 本文研究了N₂/H₂比對氮化鈦涂層的晶格常數、硬度、沉積速率的影響,在N₂/H₂≈1/2時得到組成近似于化學計量的氮化鈦,涂層硬度和沉積速率最高,涂層模具的壽命比不涂層的可提高4倍。
- 化學汽相沉積 /
- 氮化鈦 /
- 涂層 /
- 模具
Abstract: Titanium nitride can be coated on the steel-base and cemented-carbides to improve the resistant to wear and corrosion.
The effect of different N₂/H₂ ratios on the lattice parameter, hardness and the rate of the TiN deposition are researched in this paper. The results show that when optimum N₂/H₂ ratio appriximates to 0.5, the stoichiometric TiN will be formed. The hardness and the deposition rate of TiN film reach their maximum, and the lifetime of the treated surface increases by three times as compared with that of untreated ones.
- chemical vapor deposition /
- titanium nitride /
- dies /
- coat

參考文獻(0)

資源附件(0)

WeChat

點擊查看大圖

計量

文章訪問數: 236
HTML全文瀏覽量: 75
PDF下載量: 9
被引次數: 0

/

下載: 全尺寸圖片幻燈片

分享

用微信掃碼二維碼

分享至好友和朋友圈

返回

中文字幕在线观看