Infrared Optical Properties of Diamond Films Deposited at Low Temperatures
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摘要: 采用微波等離子體CVD兩段式低溫沉積技術,在700~400℃溫度范圍內沉積了紅外增透性良好的金剛石薄膜,結果表明,采用高甲烷濃度可以實現較低沉積溫度下的高密度形核,獲得光學平整的金剛石薄膜,施加直流偏壓的方法在低溫下對金剛石形核的促進作用不明顯,實驗觀測到的最大增透率達20%,最大紅外透射率接近80%,可滿足不同氣氛下金剛石容器的應用。Abstract: Optical smooth diamond films have been deposited at low temperatures (400~700℃) and their IR properties were studied for infrared optical coating applications.High density diamond nucleation was realized by a "Two Step Process" in which a high methane concentration was used for nucleation enhancement. However, biasing was shown insufficient for nucleation enhancement at low temperatures.Transmittance as high as 80% for diamond coated single crystal silicon wafer was observed.This level of IR transmission is good enough for practical applications of Si windows in a severe atmosphere.
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Key words:
- diamond film /
- low temperature deposition /
- infrared optics
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