Thermo-Chemical Polishing of Large Area CVD Diamond Films

LIU Jingming; JIANG Zheng; ZHANG Hengda; LV Fanxiu; TANG Weizhong

doi:10.13374/j.issn1001-053x.2001.01.038

Volume 23 Issue 1

Aug. 2021

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Article Navigation > Chinese Journal of Engineering > 2001 > 23(1): 42-44

LIU Jingming, JIANG Zheng, ZHANG Hengda, LV Fanxiu, TANG Weizhong. Thermo-Chemical Polishing of Large Area CVD Diamond Films[J]. Chinese Journal of Engineering, 2001, 23(1): 42-44. doi: 10.13374/j.issn1001-053x.2001.01.038

Citation:

LIU Jingming, JIANG Zheng, ZHANG Hengda, LV Fanxiu, TANG Weizhong. Thermo-Chemical Polishing of Large Area CVD Diamond Films[J]. Chinese Journal of Engineering, 2001, 23(1): 42-44. doi: 10.13374/j.issn1001-053x.2001.01.038

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Thermo-Chemical Polishing of Large Area CVD Diamond Films

doi: 10.13374/j.issn1001-053x.2001.01.038

Material Science and Engineering School, UST Beijing, Beijing 100083, China

Received Date: 2000-08-28

Abstract

Abstract

The first domestic thermo-chemical polishing apparatus is setup. Three φl10 mm in diameter diamond films can be polished simultaneously at 10^-3Pa from 750℃ to 100℃, with the polishing rate increasing with increasing temperature. The results of polishing at 980℃ showed that polishing of CVD diamond films is very efficient. Thermo-chemical polishing mechanism is based on the transformation of diamond into graphite and the atomic dissolution of carbon into a hot metal.
- CVD diamond films,
- thermo-chemical polishing,
- graphite,
- diffusion